Print Email Facebook Twitter High-throughput parallel SPM for metrology, defect, and mask inspection Title High-throughput parallel SPM for metrology, defect, and mask inspection Author Sadeghian Marnani, H. Herfst, R.W. Van den Dool, T.C. Crowcombe, W.E. Winters, J. Kramer, G.F.I.J. Faculty Mechanical, Maritime and Materials Engineering Department Precision and Microsystems Engineering Date 2014-06-24 Abstract Scanning probe microscopy (SPM) is a promising candidate for accurate assessment of metrology and defects on wafers and masks, however it has traditionally been too slow for high-throughput applications, although recent developments have significantly pushed the speed of SPM [1,2]. In this paper we present new results obtained with our previously presented high-throughput parallel SPM system [3,4] that showcase two key advances that are required for a successful deployment of SPM in high-throughput metrology, defect and mask inspection. The first is a very fast (up to 40 lines/s) image acquisition and a comparison of the image quality as function of speed. Secondly, a fast approach method: measurements of the scan-head approaching the sample from 0.2 and 1.0 mm distance in under 1.4 and 6 seconds respectively. Subject Scanning Probe Microscopydefect inspectionhigh-throughput metrologymask inspection To reference this document use: http://resolver.tudelft.nl/uuid:133b9bc3-86a0-4e35-b85c-6abcbf41a963 Publisher SPIE ISBN 9781628412857 Source https://doi.org/10.1117/12.2065939 Source Proceedings of SPIE 9231: 30th European Mask and Lithography Conference, Dresden, Germany, 24-25 June 2014 Part of collection Institutional Repository Document type conference paper Rights (c) 2014 SPIE Files PDF 318136.pdf 489.77 KB Close viewer /islandora/object/uuid:133b9bc3-86a0-4e35-b85c-6abcbf41a963/datastream/OBJ/view