Print Email Facebook Twitter On the uniformity of pure-boron-layer depositions Title On the uniformity of pure-boron-layer depositions Author Mohammadi, V. De Boer, W.D. Scholtes, T.L.M. Sakic, A. Heerkens, C. Nanver, L.K. Faculty Electrical Engineering, Mathematics and Computer Science Department DIMES Date 2011-11-14 Abstract In this paper, the uniformity of PureB-layers deposited on photodiode surfaces of a segmented photodetector is investigated and discussed. Low-energy E-beam (LEEB) measurements have been carried out to study the uniformity and PureB-layer thickness variations over the anode surface area. It can be conclude that the PureB-layer is thinner in the middle and thicker at the edges of the opening windows where it is adjacent to oxide on the one side, and it is thickest at the corners of the window where it is adjacent to oxide on two sides. This shows the effect of the oxide surfaces (a so-called loading effect) around the openings on the thickness of the PureB-layer. Subject pure boron layer, chemical vapor deposition, low-energy E-beam, charged particle detectors To reference this document use: http://resolver.tudelft.nl/uuid:196ff82d-6664-476a-97b7-2e74e4aab64d Publisher Technology Foundation STW Source Proceedings ICT.Open: Micro technology and micro devices SAFE 2011, Veldhoven, 14-15 Nov. 2011, 1-3 Part of collection Institutional Repository Document type conference paper Rights (c) 2011 Mohammadi, V., De Boer, W.D., Scholtes, T.L.M., Sakic, A., Heerkens, C., Nanver, L.K. Files PDF 273930.pdf 321.1 KB Close viewer /islandora/object/uuid:196ff82d-6664-476a-97b7-2e74e4aab64d/datastream/OBJ/view