Electron beam irradiation of dimethyl-(acetylacetonate) gold(III) adsorbed onto solid substrates

Wnuk, J.D.; Gorham, J.M.; Rosenberg, S.G.; Van Dorp, W.F.; Madey, T.E.; Hagen, C.W.; Fairbrother, D.H.

doi:doi:10.1063/1.3295918

Electron beam irradiation of dimethyl-(acetylacetonate) gold(III) adsorbed onto solid substrates

Title

Electron beam irradiation of dimethyl-(acetylacetonate) gold(III) adsorbed onto solid substrates

Author

Wnuk, J.D.
Gorham, J.M.
Rosenberg, S.G.
Van Dorp, W.F.
Madey, T.E.
Hagen, C.W.
Fairbrother, D.H.

Faculty

Applied Sciences

Department

Imaging Science and Technology

Date

2010-03-01

Abstract

Electron beam induced deposition of organometallic precursors has emerged as an effective and versatile method for creating two-dimensional and three-dimensional metal-containing nanostructures. However, to improve the properties and optimize the chemical composition of nanostructures deposited in this way, the electron stimulated decomposition of the organometallic precursors must be better understood. To address this issue, we have employed an ultrahigh vacuum-surface science approach to study the electron induced reactions of dimethyl-(acetylacetonate) gold(III) [AuIII(acac)Me2] adsorbed onto solid substrates. Using thin molecular films adsorbed onto cooled substrates, surface reactions, reaction kinetics, and gas phase products were studied in the incident energy regime between 40 and 1500 eV using a combination of x-ray photoelectron spectroscopy (XPS), reflection absorption infrared spectroscopy (RAIRS), and mass spectrometry (MS). XPS and RAIRS data indicate that electron irradiation of AuIII(acac)Me2 is accompanied by the reduction in AuIII to a metallic Au0 species embedded in a dehydrogenated carbon matrix, while MS reveals the concomitant evolution of methane, ethane, carbon monoxide, and hydrogen. The electron stimulated decomposition of AuIII(acac)Me2 is first-order with respect to the surface coverage of the organometallic precursor, and exhibits a rate constant that is proportional to the electron flux. At an incident electron energy of 520 eV, the total reaction cross section was ? 3.6×10?16?cm2. As a function of the incident electron energy, the maximum deposition yield was observed at ?175 eV. The structure of discrete Au-containing deposits formed at room temperature by rastering an electron beam across a highly ordered pyrolytic graphite substrate in the presence of a constant partial pressure of AuIII(acac)Me2 was also investigated by atomic force microscopy.

Subject

adsorption
atomic force microscopy
electron beam deposition
gold compounds
infrared spectra
mass spectroscopic chemical analysis
nanostructured materials
organometallic compounds
surface chemistry
X-ray photoelectron spectra