Print Email Facebook Twitter Method and apparatus for controlled manufacturing of nanometer-scale apertures Title Method and apparatus for controlled manufacturing of nanometer-scale apertures Author Storm, A.J. Zandbergen, H.W. Faculty Applied Sciences Date 2004-09-16 Abstract The invention relates to a method for manufacturing nanometer-scale apertures, wherein, in an object, in a conventional manner, at least one aperture is provided with a nanometer-scale surface area, after which, by means of an electron beam, energy is supplied to at least the edge of said at least one aperture, such that the surface area of the respective aperture is adjusted, wherein the surface area of the aperture is controlled during adjustment and the supply of energy is regulated on the basis of the surface area change. To reference this document use: http://resolver.tudelft.nl/uuid:4171cce1-0d52-4e18-9abb-7d5b737fbe5d Publisher European Patent Office Source WO 2004078640 (A1) Is part of http://v3.espacenet.com/publicationDetails/biblio?CC=WO&NR=2004078640A1&KC=A1&FT=D&date=20040916&DB=&locale=en_EP Part of collection Institutional Repository Document type patent Rights (c) 2004 Storm, A.J.; Zandbergen, H.W. Files PDF WO2004078640A1.pdf 1.57 MB Close viewer /islandora/object/uuid:4171cce1-0d52-4e18-9abb-7d5b737fbe5d/datastream/OBJ/view