Estimating resist parameters in optical lithography using the extended Nijboer-Zernike theory

Title

Estimating resist parameters in optical lithography using the extended Nijboer-Zernike theory

Author

Dirksen, P.
Braat, J.
Janssen, A.J.E.M.

Faculty

Applied Sciences

Department

Optics Research Group

Date

2006-01-30

Subject

optical lithography
resist
diffusion constant
focus noise
pointspread function
extended Nijboer-Zernike theory

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http://resolver.tudelft.nl/uuid:45a77fbd-2b5e-4381-a1bd-2d46830217c8

Publisher

SPIE

ISSN

1537-1646

Source

Journal of microlithography, microfabrication, and microsystems , 5.2006, nr.1

Part of collection

Institutional Repository

Document type

journal article

Rights

(c)2006 Dirksen, P., Braat, J., Janssen, A.J.E.M.