Print Email Facebook Twitter Photolithographic patterning of the charge-density-wave conductor Rb 0.30 MoO 3 Title Photolithographic patterning of the charge-density-wave conductor Rb 0.30 MoO 3 Author Van der Zant, H.S.J. Mantel, O.C. Heij, C.P. Dekker, C. Date 1997-02-28 Subject 180 K2.5 mum20 to 300 K400 to 500 C600 nmA6820 Solid surface structureA6855 Thin film growth, structure, and epitaxyA7145L Charge density wave systemsA7215N Collective modes: low dimensional conductorsA7335 Mesoscopic systems and quantum interferenceA7360 Electrical properties of thin films and low dimensional structuresA8115I Pulsed laser depositionA8160J Surface treatment and degradation of polymers and plasticsCDWcharge density wavecharge density wave conductorcharge density wavescurrent voltage characteristicselectrical resistivityelectrical transportelectrical transport measurementsgrain sizeINSPECmesoscopic phenomenamesoscopic systemsnonlinear current voltage characteristicspatterned structuresPeierls instabilityPeierls transitionphase coherent CDW transportphotolithographic patterningphotolithographypulsed laser depositionRb sub 0.30 MoO sub 3rubidium compoundsscanning electron microscopySEMthin filmstransport To reference this document use: http://resolver.tudelft.nl/uuid:4fb1277b-8789-4c18-a8a5-bf0c57d5e927 Publisher Elsevier ISSN 0379-6779 Source Synthetic Metals 86(1-3), 1781-1784. (1997) Part of collection Institutional Repository Document type journal article Files PDF 866853.pdf 327.76 KB Close viewer /islandora/object/uuid:4fb1277b-8789-4c18-a8a5-bf0c57d5e927/datastream/OBJ/view