Print Email Facebook Twitter Focused Electron Beam Induced Deposition of 1,1-dichloro-1-silacyclohexane, silacyclohexane and 1,3,5-trisilacyclohexane: Preliminary study on the role of low energy secondary electrons in the deposition process Title Focused Electron Beam Induced Deposition of 1,1-dichloro-1-silacyclohexane, silacyclohexane and 1,3,5-trisilacyclohexane: Preliminary study on the role of low energy secondary electrons in the deposition process Author Ingolfsson, O. Kumar, R. Hagen, C.W. Hari, S. Faculty Applied Sciences Department ImPhys/Imaging Physics Date 2015-07-22 Abstract To study the potential role of low energy secondary electrons in focused electron beam induced deposition (FEBID) we have studied FEBID using 1,1-dichloro-1-silacyclohexane, silacyclohexane and 1,3,5-trisilacyclohexane. While the first of these compounds shows appreciable cross sections for dissociative electron attachment (DEA) in the gas phase, DEA is not observed for the latter two. Dissociative ionization, on the other hand is a fairly efficient decomposition path for all three compounds. The performance of these compounds in FEBID is compared with their decomposition through low energy electrons in the gas phase and discussed in context to the role of DEA and DI in FEBID. To reference this document use: http://resolver.tudelft.nl/uuid:7d7b1cc4-e989-486e-b295-dfc37fcbde2b Publisher IOP Publishing ISSN 1742-6588 Source https://doi.org/10.1088/1742-6596/635/7/072088 Source Journal of Physics: Conference Series, 635, 2015: XXIX International Conference on Photonic, Electronic, and Atomic Collisions (ICPEAC2015), 22–28 July 2015, Toledo, Spain Part of collection Institutional Repository Document type journal article Rights (c) 2015 Creative Commons BY Files PDF 320924.pdf 292.97 KB Close viewer /islandora/object/uuid:7d7b1cc4-e989-486e-b295-dfc37fcbde2b/datastream/OBJ/view