Print Email Facebook Twitter The effect of intrinsic birefringence in deep UV-lithography Title The effect of intrinsic birefringence in deep UV-lithography Author Serebriakov, A. Maksimov, E. Bociort, F. Braat, J. Faculty Applied Sciences Department Optics Research Groep Date 2004-02-18 Abstract The subject of birefringence induced by spatial dispersion (BISD), also called intrinsic birefringence, recently became an important issue for 157-nm lithography. For the deep UV range, because of intrinsic absorption, only crystalline materials can be used as optical materials for lens manufacturing. The physical properties of crystals are basically affected by spatial dispersion, especially at very short wavelengths. The resulting BISD leads to a serious deterioration of optical image quality. Recently the mathematical formalism for analyzing those aspects of the BISD effect that are relevant for optical design has been published. In this work we give an equivalent but simplified derivation of these results. This mathematical formalism is then applied to optical system design and the correction methodology is discussed. An example of optical system is given that has been corrected for the BISD effect. Subject lithographybriefringencecrystaloptical system design To reference this document use: http://resolver.tudelft.nl/uuid:adfd90ba-e76a-498c-8cc4-43ef7289c135 Publisher SPIE ISSN 0277-786X Source Proceedings of SPIE, 2004 vol. 5249 Part of collection Institutional Repository Document type conference paper Rights (c)2004 Serebriakov, A., Maksimov, E., Bociort, F., Braat, J. Files PDF EffectSerebriakov.pdf 280.2 KB Close viewer /islandora/object/uuid:adfd90ba-e76a-498c-8cc4-43ef7289c135/datastream/OBJ/view