Print Email Facebook Twitter A kinetic study of titanium nitride chemical vapor deposition using nitrogen, hydrogen, and titanium tetrachloride Title A kinetic study of titanium nitride chemical vapor deposition using nitrogen, hydrogen, and titanium tetrachloride Author Dekker, J.P. Van der Put, P.J. Veringa, H.J. Schoonman, J. Date 1994 Subject titanium nitride chem vapor deposition kinetics chloride titanium reaction hydrogen nitrogen To reference this document use: http://resolver.tudelft.nl/uuid:b834473c-331f-44dc-8b14-3668ebcf36a3 ISSN 0013-4651 Source Journal of the Electrochemical Society 141(3), 787-795. (1994) Part of collection Institutional Repository Document type journal article Files PDF 862546.pdf 1.07 MB Close viewer /islandora/object/uuid:b834473c-331f-44dc-8b14-3668ebcf36a3/datastream/OBJ/view