Optimization-based wavefront sensorless adaptive optics for multiphoton microscopy

Antonello, J.; Van Werkhoven, T.; Verhaegen, M.; Truong, H.H.; Keller, C.U.; Gerritsen, H.C.

doi:doi:10.1364/JOSAA.31.001337

Optimization-based wavefront sensorless adaptive optics for multiphoton microscopy

Title

Optimization-based wavefront sensorless adaptive optics for multiphoton microscopy

Author

Antonello, J.
Van Werkhoven, T.
Verhaegen, M.
Truong, H.H.
Keller, C.U.
Gerritsen, H.C.

Faculty

Mechanical, Maritime and Materials Engineering

Department

Delft Center for Systems and Control

Date

2014-05-30

Abstract

Optical aberrations have detrimental effects in multiphoton microscopy. These effects can be curtailed by implementing model-based wavefront sensorless adaptive optics, which only requires the addition of a wavefront shaping device, such as a deformable mirror (DM) to an existing microscope. The aberration correction is achieved by maximizing a suitable image quality metric. We implement a model-based aberration correction algorithm in a second-harmonic microscope. The tip, tilt, and defocus aberrations are removed from the basis functions used for the control of the DM, as these aberrations induce distortions in the acquired images. We compute the parameters of a quadratic polynomial that is used to model the image quality metric directly from experimental input–output measurements. Finally, we apply the aberration correction by maximizing the image quality metric using the least-squares estimate of the unknown aberration.

Subject

active or adaptive optics
wave-front sensing
aberration compensation
imaging through turbid media
scanning microscopy
nonlinear microscopy

To reference this document use:

http://resolver.tudelft.nl/uuid:b9cf2755-d68c-4adc-80ce-5e5e2b4c3cdc

DOI

https://doi.org/10.1364/JOSAA.31.001337

Publisher

Optical Society of America

ISSN

1084-7529

Source

http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-31-6-1337