Print Email Facebook Twitter Through-membrane electron-beam lithography for ultrathin membrane applications Title Through-membrane electron-beam lithography for ultrathin membrane applications Author Neklyudova, M. (TU Delft QN/Zandbergen Lab; Kavli institute of nanoscience Delft) Erdamar, A.K. (TU Delft QN/Zandbergen Lab; Kavli institute of nanoscience Delft) Vicarelli, L. (TU Delft QN/Zandbergen Lab; Kavli institute of nanoscience Delft) Heerema, S.J. (TU Delft BN/Cees Dekker Lab; Kavli institute of nanoscience Delft) Rehfeldt, T. (TU Delft BN/Cees Dekker Lab; Kavli institute of nanoscience Delft) Pandraud, G. (TU Delft Else Kooi Laboratory) Koladouz Esfahani, Z. (TU Delft QN/Zandbergen Lab; Kavli institute of nanoscience Delft) Dekker, C. (TU Delft BN/Cees Dekker Lab; Kavli institute of nanoscience Delft) Zandbergen, H.W. (TU Delft QN/Zandbergen Lab; Kavli institute of nanoscience Delft) Department Else Kooi Laboratory Date 2017-08-07 Abstract We present a technique to fabricate ultrathin (down to 20 nm) uniform electron transparent windows at dedicated locations in a SiN membrane for in situ transmission electron microscopy experiments. An electron-beam (e-beam) resist is spray-coated on the backside of the membrane in a KOH-etched cavity in silicon which is patterned using through-membrane electron-beam lithography. This is a controlled way to make transparent windows in membranes, whilst the topside of the membrane remains undamaged and retains its flatness. Our approach was optimized for MEMS-based heating chips but can be applied to any chip design. We show two different applications of this technique for (1) fabrication of a nanogap electrode by means of electromigration in thin free-standing metal films and (2) making low-noise graphene nanopore devices. To reference this document use: http://resolver.tudelft.nl/uuid:c4486afa-a5e5-48ba-976a-7ecc010d9dba DOI https://doi.org/10.1063/1.4986991 Embargo date 2018-08-09 ISSN 0003-6951 Source Applied Physics Letters, 111 (6), 1-5 Part of collection Institutional Repository Document type journal article Rights © 2017 M. Neklyudova, A.K. Erdamar, L. Vicarelli, S.J. Heerema, T. Rehfeldt, G. Pandraud, Z. Koladouz Esfahani, C. Dekker, H.W. Zandbergen Files PDF 1.4986991.pdf 1.12 MB Close viewer /islandora/object/uuid:c4486afa-a5e5-48ba-976a-7ecc010d9dba/datastream/OBJ/view