Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering

Title

Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering

 Author

Rafieian, Damon (University of Twente)
Ogieglo, Wojciech (University of Twente)
Savenije, T.J. (TU Delft ChemE/Opto-electronic Materials) ORCID 0000-0003-1435-9885
Lammertink, Rob G H (University of Twente)

Date

2015-09-01

 Abstract

We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to anatase or rutile, depending on the initial sputtering conditions. Substoichiometric films (TiOx), obtained by sputtering at relatively low oxygen concentration, formed rutile upon annealing in air, whereas stoichiometric films formed anatase. This route therefore presents a formation route for rutile films via lower (


 To reference this document use:

http://resolver.tudelft.nl/uuid:c8df094d-7a09-4c2d-958e-590adc0bbe62

 DOI

https://doi.org/10.1063/1.4931925

 ISSN

2158-3226

 Source

AIP Advances, 5 (9)

 Part of collection

Institutional Repository

 Document type

journal article

 Rights

© 2015 Damon Rafieian, Wojciech Ogieglo, T.J. Savenije, Rob G H Lammertink
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