Print Email Facebook Twitter Improved extreme ultraviolet light source Title Improved extreme ultraviolet light source Author Mulder, F.M. Faculty Applied Sciences Department ChemE/Chemical Engineering Date 2015-07-23 Abstract The present invention relates to an Extreme Ultra Violet light source, to a trap for use in such a light source, to a multilayer mirror for use in such a light source, to a grazing incident mirror for use in such a light source, and to a multi- layer for use in the multilayer mirror. Such a light source may for instance be used in lithography, such as used in semiconductor integrated circuit production. To reference this document use: http://resolver.tudelft.nl/uuid:c8e0c3c7-fc52-45ca-8a79-ee3b550ab5e4 Publisher European Patent Office Source http://worldwide.espacenet.com/publicationDetails/biblio?DB=EPODOC&II=37&ND=3&adjacent=true&locale=en_EP&FT=D&date=20150723&CC=WO&NR=2015108420A1&KC=A1 Source WO 2015108420 (A1) Part of collection Institutional Repository Document type patent Rights (c) 2015 The Author(s) Files PDF WO2015108420A1.pdf 1.69 MB Close viewer /islandora/object/uuid:c8e0c3c7-fc52-45ca-8a79-ee3b550ab5e4/datastream/OBJ/view