Improved extreme ultraviolet light source

Title

Improved extreme ultraviolet light source

 Author

Mulder, F.M.

Faculty

Applied Sciences

 Department

ChemE/Chemical Engineering

 Date

2015-07-23

 Abstract

The present invention relates to an Extreme Ultra Violet light source, to a trap for use in such a light source, to a multilayer mirror for use in such a light source, to a grazing incident mirror for use in such a light source, and to a multi- layer for use in the multilayer mirror. Such a light source may for instance be used in lithography, such as used in semiconductor integrated circuit production.

 To reference this document use:

http://resolver.tudelft.nl/uuid:c8e0c3c7-fc52-45ca-8a79-ee3b550ab5e4

 Publisher

European Patent Office

 Source

http://worldwide.espacenet.com/publicationDetails/biblio?DB=EPODOC&II=37&ND=3&adjacent=true&locale=en_EP&FT=D&date=20150723&CC=WO&NR=2015108420A1&KC=A1

 Source

WO 2015108420 (A1)

 Part of collection

Institutional Repository

 Document type

patent

 Rights

(c) 2015 The Author(s)
Files
PDF WO2015108420A1.pdf 1.69 MB
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