Print Email Facebook Twitter Designing lithographic objectives by constructing saddle points Title Designing lithographic objectives by constructing saddle points Author Marinescu, O. Bociort, F. Faculty Applied Sciences Department Optics Research Group Date 2006-08-30 Abstract Optical designers often insert or split lenses in existing designs. Here, we present, with examples from Deep and Extreme UV lithography, an alternative method that consists of constructing saddle points and obtaining new local minima from them. The method is remarkable simple and can therefore be easily integrated with the traditional design techniques. It has significantly improved the productivity of the design process in all cases in which it has been applied so far. Subject saddle pointlithographyoptical system designoptimizationDUVEUV To reference this document use: http://resolver.tudelft.nl/uuid:cdd281b2-0bc7-4f57-a9fb-3ddbe49c1082 Publisher SPIE ISSN 0277-786X Source Proceedings of SPIE, 2007 vol. 6342 Part of collection Institutional Repository Document type conference paper Rights (c)2007 Marinescu, O., Bociort, F. Files PDF DesignmingMaricescu.pdf 249.22 KB Close viewer /islandora/object/uuid:cdd281b2-0bc7-4f57-a9fb-3ddbe49c1082/datastream/OBJ/view