Print Email Facebook Twitter Projection lens testing with Moiré effect Title Projection lens testing with Moiré effect Author Loktev, M. (Liteq B.V.) Shao, Y. (TU Delft ImPhys/Optics) Contributor Sanchez, Martha I. (editor) Date 2017 Abstract The application of Moiré effect for testing of a lithographic projection lens is reported. The arrangement presented allows measuring magnification, distortion, field curvature and telecentricity of the lens and can be used for its fine tuning. The method is based on two matched two-dimensional gratings, positioned in mutually conjugated planes; one of them can be translated. Visual interpretation of Moiré fringe pattern allows quick diagnostics of position errors exceeding critical dimension, whereas lateral scanning is applied for measuring of smaller magnitude errors. Field curvature and telecentricity are measured by 3D scanning. Presented results are in a good agreement with those obtained elsewhere. Subject DistortionLithographyMoiré effectOptical metrologyProjection lens To reference this document use: http://resolver.tudelft.nl/uuid:ed528103-53c7-43f0-a201-560cd584a30d DOI https://doi.org/10.1117/12.2264343 Publisher SPIE, Bellingham, WA, USA ISBN 978-1-510607415 Source Metrology, Inspection, and Process Control for Microlithography XXXI Event 31st Conference on Metrology, Inspection, and Process Control for Microlithography 2017, 2017-02-27 → 2017-03-02, San Jose, United States Series Proceedings of SPIE, 1605-7422, 10145 Part of collection Institutional Repository Document type conference paper Rights © 2017 M. Loktev, Y. Shao Files PDF 101452S.pdf 1.64 MB Close viewer /islandora/object/uuid:ed528103-53c7-43f0-a201-560cd584a30d/datastream/OBJ/view