Print Email Facebook Twitter Investigation of "fur-like" residues post dry etching of polyimide using aluminum hard etch mask Title Investigation of "fur-like" residues post dry etching of polyimide using aluminum hard etch mask Author Joshi, S. (TU Delft Electronic Components, Technology and Materials) Savov, A.M. (TU Delft Electronic Components, Technology and Materials) Shafqat, Salman (Eindhoven University of Technology) Dekker, R. (TU Delft Electronic Components, Technology and Materials; Philips Research) Date 2018 Abstract The authors found that oxygen plasma etching of polyimide (PI) with aluminum (Al) as a hard-etch mask results in lightly textured arbitrary shaped “fur-like” residues. Upon investigation, the presence of Al was detected in these residues. Ruling out several causes of metal contamination that were already reported in literature, a new theory for the presence of the metal containing residues is described. Furthermore, different methods for the residue free etching of PI using an Al hard-etch by using different metal deposition and patterning methods are explored. A fur-free procedure for the etching of PI using a one step-reactive ion etch of the metal hard-etch mask is presented. Subject PolymersReactive ion etchingSputteringResiduesPI residues To reference this document use: http://resolver.tudelft.nl/uuid:eede4816-b88f-4c01-896f-84cf654df9ed DOI https://doi.org/10.1016/j.mssp.2017.11.025 Embargo date 2019-12-13 ISSN 1369-8001 Source Materials Science in Semiconductor Processing, 75, 130-135 Bibliographical note Accepted author manuscript Part of collection Institutional Repository Document type journal article Rights © 2018 S. Joshi, A.M. Savov, Salman Shafqat, R. Dekker Files PDF ShivaniJoshi_Second_Revis ... ion_3_.pdf 19.35 MB Close viewer /islandora/object/uuid:eede4816-b88f-4c01-896f-84cf654df9ed/datastream/OBJ/view