Chemical vapor deposition of titanium diboride using boron tribromide, titanium tetrachloride, and hydrogen

Title

Chemical vapor deposition of titanium diboride using boron tribromide, titanium tetrachloride, and hydrogen

Author

Dekker, J.P.
Van der Put, P.J.
Schoonman, J.
Veringa, H.J.

Date

1993

Subject

titanium boride CVD reaction kinetics titanium tetrachloride CVD titanium boride boron bromide CVD titanium boride

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http://resolver.tudelft.nl/uuid:f1410e96-05eb-48d9-9f33-f115a64fd4ed

ISSN

1056-7860

Source

Journal of Chemical Vapor Deposition 1(4), 317-332. (1993)

Part of collection

Institutional Repository

Document type

journal article