Print Email Facebook Twitter Low-temperature atomic layer deposition delivers more active and stable Pt-based catalysts Title Low-temperature atomic layer deposition delivers more active and stable Pt-based catalysts Author Bui, H.V. (TU Delft ChemE/Product and Process Engineering) Grillo, F. (TU Delft ChemE/Product and Process Engineering) Kulkarni, S.S. (TU Delft ChemE/Product and Process Engineering) Bevaart, Ronald (Student TU Delft) Nguyên, V.T. (TU Delft RST/Fundamental Aspects of Materials and Energy) van der Linden, B. (TU Delft ChemE/O&O groep) Moulijn, J.A. (TU Delft ChemE/Catalysis Engineering) Makkee, M. (TU Delft ChemE/Catalysis Engineering) Kreutzer, M.T. (TU Delft ChemE/Chemical Engineering) van Ommen, J.R. (TU Delft ChemE/Product and Process Engineering) Department ChemE/Chemical Engineering Date 2017-08-14 Abstract We tailored the size distribution of Pt nanoparticles (NPs) on graphene nanoplatelets at a given metal loading by using low-temperature atomic layer deposition carried out in a fluidized bed reactor operated at atmospheric pressure. The Pt NPs deposited at low temperature (100 °C) after 10 cycles were more active and stable towards the propene oxidation reaction than their high-temperature counterparts. Crucially, the gap in the catalytic performance was retained even after prolonged periods of time (>24 hours) at reaction temperatures as high as 450 °C. After exposure to such harsh conditions the Pt NPs deposited at 100 °C still retained a size distribution that is narrower than the one of the as-synthesized NPs obtained at 250 °C. The difference in performance correlated with the difference in the number of facet sites as estimated after the catalytic test. Our approach provides not only a viable route for the scalable synthesis of stable supported Pt NPs with tailored size distributions but also a tool for studying the structure-function relationship. To reference this document use: http://resolver.tudelft.nl/uuid:f399c76b-72b5-408f-b223-897c003a349d DOI https://doi.org/10.1039/c7nr02984e ISSN 2040-3364 Source Nanoscale, 9 (30), 10802-10810 Part of collection Institutional Repository Document type journal article Rights © 2017 H.V. Bui, F. Grillo, S.S. Kulkarni, Ronald Bevaart, V.T. Nguyên, B. van der Linden, J.A. Moulijn, M. Makkee, M.T. Kreutzer, J.R. van Ommen Files PDF c7nr02984e.pdf 2.66 MB Close viewer /islandora/object/uuid:f399c76b-72b5-408f-b223-897c003a349d/datastream/OBJ/view