Print Email Facebook Twitter Tip-based chemical vapor deposition with a scanning nano-heater Title Tip-based chemical vapor deposition with a scanning nano-heater Author Gaitas, A. Faculty Electrical Engineering, Mathematics and Computer Science Date 2013-04-02 Abstract In this preliminary effort, a moving nano-heater directs a chemical vapor deposition reaction (nano-CVD) demonstrating a tip-based nanofabrication (TBN) method. Localized nano-CVD of copper (Cu) and copper oxide (CuO) on a silicon (Si) and silicon oxide (SiO2) substrate from gasses, namely sublimated copper acetylacetonate (Cu(acac)2), argon (Ar), and oxygen (O2), is demonstrated. This technique is applicable to other materials. Subject chemical vapour depositioncoppercopper compoundsmanufacturing processesnanofabricationnanostructured materials To reference this document use: http://resolver.tudelft.nl/uuid:f5d77311-ce6b-4e55-b767-cec44ef2e6da DOI https://doi.org/10.1063/1.4799654 Publisher American Institute of Physics ISSN 0003-6951 Source https://doi.org/10.1063/1.4799654 Source Applied Physcis Letters, 102 (13), 2013 Part of collection Institutional Repository Document type journal article Rights © 2013 American Institute of Physics Files PDF Gaitas_2013.pdf 415.98 KB Close viewer /islandora/object/uuid:f5d77311-ce6b-4e55-b767-cec44ef2e6da/datastream/OBJ/view