Print Email Facebook Twitter Mimicking an Atomically Thin "Vacuum Spacer" to Measure the Hamaker Constant between Graphene Oxide and Silica Title Mimicking an Atomically Thin "Vacuum Spacer" to Measure the Hamaker Constant between Graphene Oxide and Silica Author Chu, L. (TU Delft OLD ChemE/Organic Materials and Interfaces) Korobko, A.V. (TU Delft OLD ChemE/Organic Materials and Interfaces) Cao, A. (TU Delft OLD ChemE/Organic Materials and Interfaces) Sachdeva, S. (TU Delft OLD ChemE/Organic Materials and Interfaces) Liu, Z. (TU Delft OLD ChemE/Organic Materials and Interfaces) de Smet, L.C.P.M. (TU Delft OLD ChemE/Organic Materials and Interfaces) Sudhölter, Ernst J. R. (TU Delft OLD ChemE/Organic Materials and Interfaces) Picken, S.J. (TU Delft ChemE/Advanced Soft Matter) Besseling, N.A.M. (TU Delft OLD ChemE/Organic Materials and Interfaces) Date 2017 Abstract The Hamaker constant between graphene oxide and silica, which quantifies the strength of van der Waals forces is determined, by mimicking a “vacuum spacer” in an atomic force microscopyforce study. It is demonstrated that, a 2D spacer is expected to yield an accurately defined separation, owing to the high atom density and strength in planar direction compared with other dimensional spacers. Subject 2D materialsAtomic force microscopyGraphene oxideHamaker constantVacuum spacers To reference this document use: http://resolver.tudelft.nl/uuid:ff69215c-eaf4-40dc-8083-0a27f48b45b3 DOI https://doi.org/10.1002/admi.201600495 Embargo date 2017-12-22 Source Advanced Materials Interfaces, 4 (5), 1-5 Part of collection Institutional Repository Document type journal article Rights © 2017 L. Chu, A.V. Korobko, A. Cao, S. Sachdeva, Z. Liu, L.C.P.M. de Smet, Ernst J. R. Sudhölter, S.J. Picken, N.A.M. Besseling Files PDF Hamaker_constant_Liangyong1.pdf 2.66 MB Close viewer /islandora/object/uuid:ff69215c-eaf4-40dc-8083-0a27f48b45b3/datastream/OBJ/view