Print Email Facebook Twitter Measurements from a novel interferometer for EUVL mirror substrates Title Measurements from a novel interferometer for EUVL mirror substrates Author Krieg, M.L. Braat, J.J.M. Faculty Applied Sciences Department Imaging Science and Technology Date 2005-06-13 Abstract A previously reported interferometer without intermediate optics is used to perform measurements on an aspherical extreme ultraviolet lithography mirror substrate. Acousto-optic modulation based phase shifting is used together with a novel phase retrieval algorithm to retrieve the phase distribution from our interferograms. The phase distribution is then processed by a previously reported inverse propagation algorithm to give the shape of the mirror under test. Our results are compared with measurements performed with conventional Fizeau interferometry and the discrepancies are discussed with reference to systematic error sources inherent in the classical and novel interferometers. Subject interferometryEUVLphase shiftingmetrology To reference this document use: http://resolver.tudelft.nl/uuid:34936d75-bb7c-4531-b68d-bae2fcc61f99 Publisher SPIE ISSN 0277-786X Source Proceedings of SPIE, 2005 vol. 5856 Part of collection Institutional Repository Document type conference paper Rights (c)2005 Krieg, M.L., Braat, J.J.M. Files PDF MeasurementsKrieg.pdf 1.35 MB Close viewer /islandora/object/uuid:34936d75-bb7c-4531-b68d-bae2fcc61f99/datastream/OBJ/view