Print Email Facebook Twitter The chemical-mechanical relationship of the SiOC(H) dielectric film Title The chemical-mechanical relationship of the SiOC(H) dielectric film Author Yuan, C. Van Der Sluis, O. Zhang, G.Q. Ernst, L.J. Van Driel, W.D. Van Silfhout, R.B.R. Thijsse, B.J. Faculty Mechanical Maritime and Materials Engineering Date 2007 To reference this document use: http://resolver.tudelft.nl/uuid:76b2ee0d-7c39-4426-ad1c-7825965cb4e0 Publisher IEEE ISBN 1-4244-1106-8 Source proceedings of the International Conference on Thermal, Mechanical and Multi-Physics Simulation Experiments in Microelectronics and Micro-Systems, London, April 15-18, 2007 Part of collection Institutional Repository Document type conference paper Rights (c) 2007 Yuan, C.; Van Der Sluis, O.; Zhang, G.Q.; Ernst, L.J.; Van Driel, W.D.; Van Silfhout, R.B.R.; Thijsse, B.J. Files PDF 2007-37.pdf 6.57 MB Close viewer /islandora/object/uuid:76b2ee0d-7c39-4426-ad1c-7825965cb4e0/datastream/OBJ/view