Vectorial diffraction of extreme ultraviolet light and ultrashort light pulses

Vectorial diffraction of extreme ultraviolet light and ultrashort light pulses

Nugrowati, A.M.

Braat, J.J.M. (promotor)

Applied Sciences

2008-06-17

In this thesis, we present applications in optics involving the diffraction theory of light for two advanced technologies. We have used a rigorous vectorial diffraction method to model: (i) the imaging of mask structures in extreme ultraviolet lithography, and (ii) ultrashort pulse propagation through small apertures. We have explained the chronological development of the method, the full derivation to implement the method, and we have also given several educational examples. Therefore, the method is not only a tool to calculate the effects but also to understand the physics behind the results. The first objective is to study the potential and challenges of the optical lithographic technique at the extreme ultraviolet wavelength region (at about Λ = 13.5 nm). We have investigated the application of the phase mask concept at this wavelength range, in order to increase the resolution (decrease the printed size) in the image plane of the projection system. Together with our optimised designs, the phase mask concept is necessary to be applied in the extreme ultraviolet lithography technique, when the desired image resolution becomes comparable to the dimension of the wavelength. In the discussion regarding our second objective, we have demonstrated that small slit apertures illuminated by the two fundamental polarisation modes (transverse electric and transverse magnetic) introduce polarisation-dependent dispersion effect that can be used for interesting applications. When using a double slit aperture, similar to the Young's double-slit experiment, the interference pattern resulting from the diffracted light from both slits can be properly explained. The interference pattern is influenced by several effects, i.e. the waveguiding effect of the slit that is polarisation-dependent, the diffraction by the slit aperture, and the generation of surface-bounded waves on the metal that appears for the transverse magnetic incident wave. The demonstrated high spatial and temporal information can be exploited for more advanced applications in optics, such as microscopy, spectroscopy, femtochemistry, etc.

diffraction
fourier modal method (fmm)
extreme ultraviolet (euv)
lithography
phase mask
ultrashort pulses
small apertures
polarisation

http://resolver.tudelft.nl/uuid:8699c005-6783-4a7e-9365-da4e1a3c15ff

978-90-78314-09-7

Institutional Repository

doctoral thesis

(c) 2008 A.M. Nugrowati