Print Email Facebook Twitter Chemical vapor deposition in the system titanium-nitrogen-boron: Titanium mononitride as a diffusion barrier for boron Title Chemical vapor deposition in the system titanium-nitrogen-boron: Titanium mononitride as a diffusion barrier for boron Author Becht, J.G.M. Van der Put, P.J. Schoonman, J. Date 1989 Subject deposition titanium nitride boron diffusion barrier To reference this document use: http://resolver.tudelft.nl/uuid:e6869d75-50d5-4a4a-98de-b088b2e26d4f ISSN 0992-4361 Source European Journal of Solid State and Inorganic Chemistry 26(4), 401-412. (1989) Part of collection Institutional Repository Document type journal article Files PDF 862206.pdf 884.11 KB Close viewer /islandora/object/uuid:e6869d75-50d5-4a4a-98de-b088b2e26d4f/datastream/OBJ/view